Metal-organic frameworks as promising candidates for future ultralow-k dielectrics

Applied Physics Letters

Volumn 97, Issue 25, 2010, Pages

  Zagorodniy, K ^a   Seifert, G ^a   Hermann, H ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BULK MODULUS; DIELECTRIC CONSTANTS; GAP ENERGY; INTER-LAYER DIELECTRIC MATERIALS; METAL ORGANIC FRAMEWORK; ULTRA-LOW DIELECTRIC CONSTANT; ULTRA-LOW-K DIELECTRICS;

PERMITTIVITY;

DIELECTRIC MATERIALS;

EID: 78650725917     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3529461     Document Type: Article

References (19)

1. M. E. Davis, Nature (London) NATUAS 0028-0836 417, 813 (2002). 10.1038/nature00785 (Pubitemid 34685481)
2. A. Kuc, A. Enyashin, and G. Seifert, J. Phys. Chem. B JPCBFK 1089-5647 111, 8179 (2007). 10.1021/jp072085x (Pubitemid 47184394)
3. R. J. O. M. Hoofman, G. J. A. M. Verheijden, J. Michelon, F. Iacopi, Y. Travaly, M. R. Baklanov, Zs. Tökei, and G. P. Beyer, Microelectron. Eng. MIENEF 0167-9317 80, 337 (2005). 10.1016/j.mee.2005.04.088 (Pubitemid 40753107)
4. D. Greenlaw, G. Burbach, T. Feudel, F. Feustel, K. Frohberg, F. Graetsch, G. Grasshoff, C. Hartig, T. Heller, K. Hempel, M. Horstmann, P. Huebler, R. Kirsch, S. Kruegel, E. Langer, A. Pawlowitsch, H. Ruelke, H. Schuehrer, R. Stephan, A. Wei, T. Werner, K. Wieczorek, M. Raab, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918 2003, 277.
5. See: www.itrs.net, chapter Interconnect, Table INTC6.
6. K. Zagorodniy, D. Chumakov, C. Taschner, A. Lukowiak, H. Stegmann, D. Schmeisser, H. Geisler, H. -J. Engelmann, H. Hermann, and E. Zschech, IEEE Trans. Semicond. Manuf. ITSMED 0894-6507 21, 646 (2008). 10.1109/TSM.2008. 2005396
7. H. L. Xin, P. Ercius, K. J. Hughes, J. R. Engstrom, and D. A. Muller, Appl. Phys. Lett. APPLAB 0003-6951 96, 223108 (2010). 10.1063/1.3442496
8. T. C. Choy, Effective Medium Theory (Clarendon, Oxford, 1999), p. 5.
9. K. Zagorodniy, M. Taut, and H. Hermann, Phys. Rev. A PLRAAN 1050-2947 73, 054501 (2006). 10.1103/PhysRevA.73.054501
10. K. Zagorodniy, M. Taut, and H. Hermann, Phys. Rev. B PLRBAQ 0556-2805 75, 245430 (2007). 10.1103/PhysRevB.75.245430
11. K. Zagorodniy, H. Hermann, M. Taut, G. Seifert, and E. Zschech, Microelectron. Eng. MIENEF 0167-9317 85, 2118 (2008). 10.1016/j.mee.2008.05.024
12. A. K. Ghose and G. M. Crippen, J. Comput. Chem. JCCHDD 0192-8651 7, 565 (1986). 10.1002/jcc.540070419
13. A. K. Ghose and G. M. Crippen, J. Chem. Inf. Comput. Sci. JCISD8 0095-2338 27, 21 (1987). 10.1021/ci00053a005
14. Y. Wang, G. Seifert, and H. Hermann, Phys. Status Solidi A PSSABA 0031-8965 203, 3868 (2006). 10.1002/pssa.200622312 (Pubitemid 46034565)
15. J. C. Phillips, Phys. Rev. Lett. PRLTAO 0031-9007 20, 550 (1968). 10.1103/PhysRevLett.20.550
16. K. S. Park, Z. Ni, A. P. Cote, J. Y. Choi, R. D. Huang, F. J. Uribe-Romo, H. K. Chae, M. O'Keeffe, and O. M. Yaghi, Proc. Natl. Acad. Sci. U.S.A. PNASA6 0027-8424 103, 10186 (2006). 10.1073/pnas.0602439103 (Pubitemid 44051141)
17. S. S. Y. Chui, S. M. F. Lo, J. P. H. Charmant, A. G. Orpen, and I. D. Williams, Science SCIEAS 0036-8075 283, 1148 (1999). 10.1126/science.283.5405. 1148 (Pubitemid 29102213)
18. M. Dinc, A. Dailly, Y. Liu, C. M. Brown, D. A. Neumann, and J. R. Long, J. Am. Chem. Soc. JACSAT 0002-7863 128, 16876 (2006). 10.1021/ja0656853 (Pubitemid 46032763)
19. V. P. Shevelko and A. V. Vinogradov, Phys. Scr. PHSTBO 0031-8949 19, 275 (1979). 10.1088/0031-8949/19/3/010