Mechanical and dielectric properties of pure-silica-zeolite low-k materials

Angewandte Chemie - International Edition

Volumn 45, Issue 38, 2006, Pages 6329-6332

  Li, Zijian ^a   Johnson, Mark C ^a   Sun, Minwei ^a   Ryan, E Todd ^b   Earl, David J ^c   Maichen, Wolfgang ^d   Martin, Jeremy I ^b   Li, Shuang ^a   Lew, Christopher M ^a   Wang, Junlan ^a   Deem, Michael W ^c   Davis, Mark E ^e   Yan, Yushan ^a  

^a University of California Riverside   (United States)

^b ADVANCED MICRO DEVICES   (United States)

^c RICE UNIVERSITY   (United States)

^d Teradyne Inc Woodland Hills   (United States)

^e California Institute of Technology   (United States)

Author keywords

Mechanical properties; Porous materials; Silicates; Thin films; Zeolites

Indexed keywords

LOW-K INSULATORS; LOW-K MATERIALS; PURE-SILICA-ZEOLITES;

CRYSTAL STRUCTURE; CRYSTALLIZATION; DIELECTRIC PROPERTIES; MECHANICAL PROPERTIES; POROUS MATERIALS; SILICA; SILICATES; THIN FILMS;

ZEOLITES;

SILICON DIOXIDE; ZEOLITE;

ARTICLE; CHEMISTRY; ELECTRIC CAPACITANCE; ELECTRON MICROSCOPY; ELECTRONICS; X RAY CRYSTALLOGRAPHY;

CRYSTALLOGRAPHY, X-RAY; ELECTRIC CAPACITANCE; ELECTRONICS; MICROSCOPY, ELECTRON; SILICON DIOXIDE; ZEOLITES;

EID: 33749260523     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/anie.200602036     Document Type: Article

References (29)

1. International Technology Roadmap for Semiconductors 2005.
2. R. D. Miller, Science 1999, 286, 421.
3. M. Morgen, E. T. Ryan, J. H. Zhao, C. Hu, T. H. Cho, P. S. Ho, Annu. Rev. Mater. Sci. 2000, 30, 645.
4. K. Maex, M. R. Baklanov, D. Shamiryan, F. Iacopi, S. H. Brongersma, Z. S. Yanovitskaya, J. Appl. Phys. 2003, 93, 8793.
5. L. W. Hrubesh, L. E. Keene, V. R. Latorre, J. Mater. Res. 1993, 8, 1736.
6. S. Seraji, Y. Wu, M. Forbess, S. J. Limmer, T. Chou, G. Z. Cao, Adv. Mater. 2000, 12, 1695.
7. D. Zhao, P. Yang, N. Melosh, J. Feng, B. F. Chmelka, G. D. Stucky, Adv. Mater. 1998, 10, 1380.
8. D. A. Doshi, N. K. Huesing, M. C. Lu, H. Y. Fan, Y. F. Lu, K. Simmons-Potter, B. G. Potter, A. J. Hurd, C. J. Brinker, Science 2000, 290, 107.
9. K. Landskron, B. D. Hatton, D. D. Perovic, G. A. Ozin, Science 2003, 302, 266.
10. R. A. Pai, R. Humayun, M. T. Schulberg, A. Sengupta, J. N. Sun, J. J. Watkins, Science 2004, 303, 507.
11. Z. J. Li, C. M. Lew, S. A. Li, D. I. Medina, Y. S. Yan, J. Phys. Chem. B 2005, 109, 8652.
12. Z. J. Li, S. Li, Y. S. Yan, Adv. Funct. Mater. 2004, 14, 1019.
13. Z. B. Wang, H. T. Wang, A. P. Mitra, L. M. Huang, Y. S. Yan, Adv. Mater. 2001, 13, 746.
14. Z. B. Wang, A. P. Mitra, H. T. Wang, L. M. Huang, Y. H. Yan, Adv. Mater. 2001, 13, 1463.
15. S. Li, Z. J. Li, Y. S. Yan, Adv. Mater. 2003, 15, 1528.
16. S. Li, J. N. Sun, Z. J. Li, H. G. Peng, D. Gidley, E. T. Ryan, Y. S. Yan, J. Phys. Chem. B 2004, 108, 11 689.
17. G. Xu, J. He, E. Andideh, J. Bielefeld, T. Scherban, in IEEE International Interconnect Technology Conference, Piscataway, NJ, San Francisco, CA, 2002, p. 57.
18. E. T. Ryan, C. Labelle, S. Nitta, N. C. M. Fuller, G. Bonilla, K. McCullough, C. Taft, H. Lin, A. Simon, E. Simonyi, K. Malone, M. Sankarapandian, D. Dunn, M. A. Zaitz, S. Cohen, N. Klymko, B. K. Moon, Z. Li, S. L, Y. Yan, J. Liu, P. S. Ho, Material Research Society Annual Conference, Vol. Materials, Technology and Reliability of Advanced Interconnects (Eds.: P. R. Besser, A. J. McKerrow, F. Iacopi, C. P. Wong, J. Vlassak), San Francisco, CA, 2005, p. B2.1.2.
19. A. Gouzinis, M. Tsapatsis, Chem. Mater. 1998, 10, 2497.
20. A. Kuperman, S. Nadimi, S. Oliver, G. A. Ozin, J. M. Garces, M. M. Olken, Nature 1993, 365, 239.
21. J. E. Lewis, C. C. Freyhardt, M. E. Davis, J. Phys. Chem. 1996, 100, 5039.
22. TDR Impedance Measurements: A Foundation for Signal Integrity, Application Note 55W-14601-0, 2001.
23. MPDyn is a freely available simulation package written by W. Shinoda and M. Shiga. See http://staff.aist.go.jp/w.shinoda/ MPDyn.
24. B. W. H. Van Beest, G. J. Kramer, R. A. Van Santen, Phys. Rev. Lett. 1990, 64, 1955.
25. R. F. S. Hearmon, Physics of the Solid State, Academic, New York, 1969.
26. J. D. Gale, A. L. Rohl, Mol. Simul. 2003, 29, 291.
27. R. A. Jackson, C R. A. Catlow, Mol. Simul. 1988, 1, 207.
28. D. Bruggeman, Ann. Phys. 1935, 24, 636.
29. K. K. Phani, S. K. Niyogi, J. Mater. Sci. 1987, 22, 257.