Zeolite-inspired low-k dielectrics overcoming limitations of zeolite films

Journal of the American Chemical Society

Volumn 130, Issue 51, 2008, Pages 17528-17536

  Eslava, Salvador ^a,b   Urrutia, Jone ^b   Busaworv, Abheesh N ^c   Baklanov, Mikhail R ^b   Iacopi, Francesca ^b   Aldea, Steliana ^a   Maex, Karen ^a   Martens, Johan A ^a   Kirschhock, Christine E A ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b IMEC   (Belgium)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC CONSTANTS; FEATURE SIZES; HYDROTHERMAL TREATMENTS; INSULATING MEDIA; LOW K DIELECTRICS; METHYLTRIMETHOXYSILANE; ON-CHIP INTERCONNECTS; PORE NETWORKS; SILICA SOURCES; SILICA SPECIES; SILICALITE-1; SOL-GEL APPROACH; SOLUTION APPROACH; SPATIAL HINDRANCE; SPIN-ON; TETRA-ETHYL-ORTHO-SILICATE; TETRAALKYLAMMONIUM; ZEOLITE FILM;

DIELECTRIC MATERIALS; GELATION; MICROELECTRONICS; OPTICAL INTERCONNECTS; SILICA; SILICATE MINERALS; SOL-GELS; SUSPENSIONS (FLUIDS); ZEOLITES;

NANOPARTICLES;

METHYLTRIMETHOXYSILANE SILICA; NANOCRYSTAL; NANOPARTICLE; OLIGOMERIC SILICA; SILANE DERIVATIVE; SILICALITE 1; TETRAALKYLAMMONIUM HYDROXIDE; TETRAETHOXYSILANE; UNCLASSIFIED DRUG; ZEOLITE;

AQUEOUS SOLUTION; ARTICLE; DIELECTRIC CONSTANT; FILM; GEL; HYDROPHOBICITY; MOLECULAR SIZE; POROSITY; RIGIDITY; SUSPENSION; SYNTHESIS;

EID: 67849092849     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja8066572     Document Type: Article

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