Plasma etching of poly(dimethylsiloxane): Roughness formation, mechanism, control, and application in the fabrication of microfluidic structures

Plasma Processes and Polymers

Volumn 10, Issue 1, 2013, Pages 29-40

  Vlachopoulou, Maria Elena ^a   Kokkoris, George ^a   Cardinaud, Christophe ^b   Gogolides, Evangelos ^a   Tserepi, Angeliki ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^b UNIVERSITÉ DE NANTES   (France)

Author keywords

microfluidics; plasma etching; polydimethylsiloxane (PDMS); superhydrophobic philic; surface roughness

Indexed keywords

COVER PLATE; ENCLOSED MICROCHANNELS; HIGH ETCH RATE; INDEPENDENT CONTROL; MASK MATERIALS; MICRO-FLUIDIC DEVICES; MICROFLUIDIC STRUCTURES; OPEN MICROCHANNEL; PDMS MICROSTRUCTURES; PLANAR TECHNOLOGY; PLASMA CONDITIONS; PLASMA POWER; POLYDIMETHYLSILOXANE PDMS; ROUGH SURFACES; SIMULTANEOUS CONTROL; SUPERHYDROPHOBIC; WALL ROUGHNESS; WETTING PROPERTY;

FABRICATION; FLUIDIC DEVICES; MICROFLUIDICS; PLASMA ETCHING; POLYDIMETHYLSILOXANE; SILICONES; SULFUR HEXAFLUORIDE; SURFACE ROUGHNESS; TOPOGRAPHY; WETTING;

MICROCHANNELS;

EID: 84872089470     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201200008     Document Type: Article

References (56)

1. S. K. Sia, G. M. Whitesides, Electrophoresis 2003, 24, 3563.
2. G. S. Fiorini, D. T. Chiu, Biotechniques 2005, 38, 429.
3. D. F. Weston, T. Smekal, D. B. Rhine, J. Blackwell, J. Vac. Sci. Technol., B 2001, 19, 2846.
4. H. Becker, L. E. Locascio, Talanta 2002, 56, 267.
5. L. E. Locascio, C. E. Perso, C. S. Lee, J. Chromatogr., A 1999, 857, 275.
6. H. Becker, C. Gartner, Anal. Bioanal. Chem. 2008, 390, 89.
7. E. Verpoorte, N. de Rooij, Proc. IEEE 2003, 91, 930.
8. A. A. S. Bhagat, P. Jothimuthu, J. Papautsky, Lab Chip 2007, 7, 1192.
9. G. B. Lee, S.-H. Chen, G.-R. Huang, W.-C. Sung, Y.-H. Lin, Sens. Actuators, B: Chem. 2001, 75, 142.
10. C.-S. Chen, D. N. Breslauer, J. I. Luna, A. Grimes, W.-C. Chin, L. P. Lee, M. Khine, Lab Chip 2008, 8, 622.
11. H. Sato, H. Matsumura, S. Keino, S. Shoji, J. Micromech. Microeng. 2006, 16, 2318.
12. Y. Murakoshi, C. S. Xue, T. Shimizu, R. Maeda, Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, Cote d' Azur, France 2003.
13. C. V. Cher, A. S. Holland, G. Rosengarten, Proc. SPIE 2004, 5275, 123.
14. Y. Xia, G. M. Whitesides, Angew. Chem., Int. Ed. 1998, 37, 550.
15. Z. J. Jheng, Y. C. Fang, K. F. Lo, Y. J. Juang, J. Micromech. Microeng. 2009, 19, 045016.
16. D. Szmigiel, K. Domanski, P. Prokaryn, P. Grabiec, Microelectron. Eng. 2006, 83, 1178.
17. D. Szmigiel, K. Domanski, P. Prokaryn, P. Grabiec, J. W. Sobczak, Appl. Surf. Sci. 2006, 253, 1506.
18. D. Szmigiel, C. Hibert, A. Bertsch, E. Pamula, K. Domanski, P. Grabiec, P. Prokaryn, A. Scislowska-Czarnecka, B. Plytycz, Plasma Process. Polym. 2008, 5, 246.
19. G. Bjornsen, L. Henriksen, J. H. Ulvensoen, J. Roots, Microelectron. Eng. 2010, 87, 67.
20. J. Garra, T. Long, J. Currie, T. Schneider, R. White, M. Paranjape, J. Vac. Sci. Technol., A 2002, 20, 975.
21. J. S. Rossier, C. Vollet, A. Carnal, G. Lagger, V. Gobry, Lab Chip 2002, 2, 145.
22. J. S. Rossier, F. Reymond, P. E. Michel, Electrophoresis 2002, 23, 858.
23. M. E. Vlachopoulou, A. Tserepi, N. Vourdas, E. Gogolides, K. Misiakos, J. Phys.: Conf. Ser. 2005, 10, 293.
24. N. Vourdas, A. Tserepi, A. G. Boudouvis, E. Gogolides, Microelectron. Eng. 2008, 85, 1124.
25. M.-E. Vlachopoulou, A. Tserepi, G. Boulousis, E. Gogolides, Proceedings μFlu08 2008, Bologna, Italy.
26. K. Tsougeni, D. Papageorgiou, A. Tserepi, E. Gogolides, Lab Chip 2010, 10, 462.
27. J. C. McDonald, D. C. Duffy, J. R. Anderson, D. T. Chiu, H. Wu, O. J. A. Schueller, G. M. Whitesides, Electrophoresis 2000, 21, 27.
28. J. M. K. Ng, I. Gitlin, A. D. Stroock, G. M. Whitesides, Electrophoresis 2002, 23, 3461.
29. J. C. McDonald, G. M. Whitesides, Acc. Chem. Res. 2002, 35, 491.
30. B. Wang, Z. Abdulali-Kanji, E. Dodwell, J. H. Horton, R. D. Oleschuk, Electrophoresis 2003, 24, 1442.
31. S. Thorslund, P. Lindberg, P. E. Andren, F. Nikolajeff, J. Bergquist, Electrophoresis 2005, 26, 4674.
32. A. Plecis, Y. Chen, Microelectron. Eng. 2007, 84, 1265.
33. J. Swaim, The 2006 NNIN REU Research Accomplishements,Ithaca NY, USA 2006.
34. E. Leclerc, Y. Sakai, T. Fujii, MNC, 2002, Tokyo, Japan.
35. A. D. Tserepi, M.-E. Vlachopoulou, E. Gogolides, Nanotechnology 2006, 17, 3977.
36. PCT/GR06/000011 (2006), invs.: A. Tserepi, E. Gogolides, K. Misiakos, M.-E. Vlachopoulou, N. Vourdas.
37. N. Vourdas, M.-E. Vlachopoulou, A. Tserepi, E. Gogolides, Int. J. Nanotechnol. 2009, 6, 196.
38. M. E. Vlachopoulou, P. S. Petrou, S. E. Kakabakos, A. Tserepi, E. Gogolides, J. Vac. Sci. Technol., A 2008, 26, 2543.
39. M. E. Vlachopoulou, A. Tserepi, P. S. Petrou, E. Gogolides, S. E. Kakambakos, Colloids Surf., B: Biointerfaces 2011, 83, 270.
40. H. Nabesawa, et al., Sens. Actuators, B 2008, 132, 637.
41. P. Bayiati, A. Tserepi, E. Gogolides, K. Misiakos, J. Vac. Sci. Technol., A 2004, 22, 1546.
42. R. Di Mundo, F. Palumbo, Plasma Process. Polym. 2011, 8, 14.
43. K. Tsougeni, A. Tserepi, G. Boulousis, V. Constantoudis, E. Gogolides, Jpn. J. Appl. Phys. 2007, 46, 744.
44. K. Tsougeni, A. Tserepi, G. Boulousis, V. Constantoudis, E. Gogolides, Plasma Process. Polym. 2007, 4, 398.
45. A. Tserepi, et al., J. Vac. Sci. Technol., B 2003, 21, 174.
46. G. Kokkoris, V. Constantoudis, P. Angelikopoulos, G. Boulousis, E. Gogolides, Phys. Rev. B 2007, 76, 193405.
47. K. Tsougeni, et al., Langmuir 2009, 25, 11748.
48. G. Boulousis, V. Constantoudis, G. Kokkoris, E. Gogolides, Nanotechnology 2008, 19, 255301.
49. C. Cardinaud, M.-C. Peignon, G. Turban, J. Electrochem. Soc. 1991, 138, 284.
50. J. A. Sethian, Level Set Methods and Fast Marching Methods. Evolving Interfaces in Computational Geometry, Fluid Mechanics, Computer Vision, and Materials Science, 2nd edition, Cambridge University Press, Cambridge 1999.
51. S. Osher, R. P. Fedkiw, Level Set Methods and Dynamic Implicit Surfaces, Applied Mathematical Sciences, Vol. 153, Springer, New York 2003.
52. G. Kokkoris, A. Tserepi, A. G. Boudouvis, E. Gogolides, J. Vac. Sci. Technol., A 2004, 22, 1896.
53. Y. Zhao, G. C. Wang, T. M. Lu, Experimental Methods in the Physical Sciences, Vol. 37, Characterization of Amorphous and Crystalline Rough Surface: Principles and Applications, Academic Press, San Diego CA, USA 2001.
54. V. Constantoudis, G. P. Patsis, A. Tserepi, E. Gogolides, J. Vac. Sci. Technol., B 2003, 21, 1019.
55. M. E. Vlachopoulou, P. S. Petrou, S. E. Kakabakos, A. Tserepi, E. Gogolides, A. Tserepi, Microeletron. Eng. 2009, 86, 1321.
56. M. E. Vlachopoulou, A. Tserepi, P. Pagoni, P. Argitis, M. Sanopoulou, K. Misiakos, J. Micromech. Microeng. 2009, 19, 015007.