Selective plasma-induced deposition of fluorocarbon films on metal surfaces for actuation in microfluidics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1546-1551

  Bayiati, P ^a   Tserepi, A ^a   Gogolides, E ^a   Misiakos, K ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROWETTING; FLUOROCARBON FILMS; MICROFLUIDICS; THERMAL CONTACTS;

ACTUATORS; ADHESION; CONTACT ANGLE; ETCHING; FLUOROCARBONS; HYDROPHILICITY; HYDROPHOBICITY; OPTIMIZATION; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SPIN COATING; SURFACE STRUCTURE; THERMAL EFFECTS; WETTING;

THIN FILMS;

EID: 4344594365     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1764815     Document Type: Conference Paper

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