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ECS Journal of Solid State Science and Technology

Volumn 1, Issue 4, 2012, Pages

Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors

(8) Premkumar, Peter Antony a Toeller, Michael b Radu, Iuliana P c Adelmann, Christoph a Schaekers, Marc a Meersschaut, Johan a Conard, Thierry a Van Elshocht, Sven a

a IMEC (Belgium)

b TOKYO ELECTRON LTD (Japan)

c UNIVERSITY OF LEUVEN (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84871807772 PISSN: 21628769 EISSN: 21628777 Source Type: Journal
DOI: 10.1149/2.009204jss Document Type: Article

Times cited : (54)

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