Growth mechanism of nanodimensional vanadium dioxide on silicon surface obtained by ML-ALD method

Reviews on Advanced Materials Science

Volumn 27, Issue 2, 2011, Pages 184-188

  Osmolowskaya, Ol'ga M ^a   Smirnov, Vladimir M ^a  

^a ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; GROWTH MECHANISMS; NANO LAYERS; NANO-SIZED; NANODIMENSIONAL; SILICA SURFACE; SILICON SURFACES; SPONTANEOUS CRYSTALLIZATION; STRUCTURE AND MORPHOLOGY; SURFACE RELIEFS; TREATMENT TEMPERATURE; VANADIUM DIOXIDE;

ATOMIC LAYER DEPOSITION; CRYSTALLITES; DIFFRACTION; SILICA; VANADIUM; VANADIUM ALLOYS; X RAY DIFFRACTION;

AMORPHOUS SILICON;

EID: 79954440451     PISSN: 16065131     EISSN: 16058127     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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