Phase-selective CVD of vanadium oxide nanostructures

Chemical Vapor Deposition

Volumn 13, Issue 1, 2007, Pages 42-47

  Mathur, Sanjay ^a   Ruegamer, Thomas ^a   Grobelsek, Ingrid ^a  

^a INM LEIBNIZ INSTITUTE FOR NEW MATERIALS   (Germany)

Author keywords

Molecular precursor; Nanostructured films; Vanadium oxide

Indexed keywords

AGGLOMERATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; ELECTRIC PROPERTIES; MODULATION; OXIDE FILMS; OXIDES; OXYGEN; SINGLE CRYSTALS; STOICHIOMETRY; TRANSITION METALS; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

DEPOSITION PROCESSES; DEPOSITION TEMPERATURES; ELECTRICAL PROPERTIES; HALL MEASUREMENTS; ISOPROPOXIDE; MOLECULAR PRECURSOR; NANOSTRUCTURED FILMS; ORIENTED AGGREGATIONS; OXYGEN CARRIERS; PRECISE; SELECTIVE SYNTHESIS; SEMICONDUCTOR TRANSITIONS; THERMAL STABILITIES; VANADIUM OXIDE; VANADIUM OXIDES;

VANADIUM;

EID: 37249004501     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606578     Document Type: Article

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