Batch atomic layer deposition of HfO2 and ZrO2 films using cyclopentadienyl precursors

ECS Transactions

Volumn 16, Issue 4, 2009, Pages 135-148

  Fischer, Pamela ^a   Pierreux, Dieter ^a   Rouault, Olivier ^a   Sirugue, Jacky ^a   Zagwijn, Peter ^a   Tois, Eva ^a   Haukka, Suvi ^a  

^a ASM International NV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; BATCH DATA PROCESSING; BATCH REACTORS; DIELECTRIC MATERIALS; HAFNIUM OXIDES; SILICA; THERMODYNAMIC STABILITY; ZIRCONIA;

CAPACITOR DIELECTRICS; CYCLOPENTADIENYL PRECURSOR; HIGH SURFACE AREA; NMR STUDIES; RESIDENCE TIME; SINGLE WAFER; THERMAL ALD; VERTICAL FURNACES;

ATOMIC LAYER DEPOSITION;

EID: 63149149454     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2979988     Document Type: Conference Paper

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