Intelligent Window Coatings: Atmospheric Pressure Chemical Vapor Deposition of Tungsten-Doped Vanadium Dioxide

Chemistry of Materials

Volumn 16, Issue 4, 2004, Pages 744-749

  Manning, Troy D ^a   Parkin, Ivan P ^a   Pemble, Martyn E ^b   Sheel, David ^b   Vernardou, Dimitra ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

INTELLIGENT WINDOW COATINGS;

ATMOSPHERIC PRESSURE;

TUNGSTEN; UNCLASSIFIED DRUG; VANADIUM; VANADIUM DIOXIDE;

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; CHEMICAL COMPOSITION; CHEMICAL REACTION; FILM; RAMAN SPECTROMETRY; REACTION ANALYSIS; REFLECTOMETRY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE DEPENDENCE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 1242297695     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm034905y     Document Type: Article

References (24)

1. Leroux, Ch.; Nihoul, G.; Van Tendeloo. G. Phys. Rev. B 1998, 57, 5111.
2. Rogers, K. D. Powder Diffr. 1993, 8, 240.
3. Morin, F. J. Phys. Rev. Lett. 1959, 3, 34.
4. Granqvist, C. G. Thin Solid Films 1990, 193/194, 730.
5. MacChesney J. B.; Guggenheim, H. J. J. Phys. Chem. Solids 1969, 30, 225.
6. Phillips, T. E.; Murray, R. A.; Poehler, T. O. Mater. Res. Bull. 1987, 22, 1113.
7. Pierce, J. W.; Goodenough, J. B. Phys. Rev. B 1972, 5, 4104.
8. Greenberg, C. B. Thin Solid Films 1983, 110, 73.
9. Béteille, F.; Livage, J. J. Sol-Gel Sci. Technol. 1998, 13, 915.
10. Burkhardt, W.; Christmann, T.; Meyer, B. K.; Niessner, W.; Schalch, D.; Scharmann, A. Thin Solid Films 1999, 345, 229.
11. Sobhan, M. A.; Kivaisi, R. T.; Stjerna B.; Granqvist, C. G. Sol. Energy Mater. Sol. Cells 1996, 44, 451.
12. Maruyama, T.; Ikuta, Y. J. Mater. Sci. 1990, 28, 5073.
13. Sheel, D. W.; Pemble, M. E. Proceedings of the International Conference of Coatings on Glass, Braunschweig, Germany, November 3-7, 2002.
14. Manning, T. D.; Parkin, I. P.; Clark, R. J. H.; Sheel, D.; Pemble, M. E. ; Vernardou, D. J. Mater. Chem. 2002, 12, 2936.
15. McNorgan, C. P.; Lennard, W. N. QUARK, version 1.3; 2001; http://www.quarksimulation.com.
16. Wisniak, J. Phase diagrams: a literature sourcebook; Elsevier Science: Amsterdam, 1986; p 3/89.
17. Riaz, U. Thin Solid Films 1993, 235, 15.
18. Jensen, K. F. Chemical Vapor Deposition: Principles and Applications; Hitchman, M. L., Jensen, K. F., Eds.; Academic Press: London, 1993; pp 35-39.
19. Parker, J. C. Phys. Rev. B 1990, 42, 3164. Aronov, A. G.; Mirlin, D. N.; Reshina I. I.; Chudnovskii, F. A. Fiz. Tverd. Tela (Leningrad) 1977, 19, 193. Aronov, A. G.; Mirlin, D. N.; Reshina I. I.; Chudnovskii, F. A. Sov. Phys. Solid State (Engl. Transl.) 1977, 19, 110.
20. Parker, J. C. Phys. Rev. B 1990, 42, 3164. Aronov, A. G.; Mirlin, D. N.; Reshina I. I.; Chudnovskii, F. A. Fiz. Tverd. Tela (Leningrad) 1977, 19, 193. Aronov, A. G.; Mirlin, D. N.; Reshina I. I.; Chudnovskii, F. A. Sov. Phys. Solid State (Engl. Transl.) 1977, 19, 110.
21. Parker, J. C. Phys. Rev. B 1990, 42, 3164. Aronov, A. G.; Mirlin, D. N.; Reshina I. I.; Chudnovskii, F. A. Fiz. Tverd. Tela (Leningrad) 1977, 19, 193. Aronov, A. G.; Mirlin, D. N.; Reshina I. I.; Chudnovskii, F. A. Sov. Phys. Solid State (Engl. Transl.) 1977, 19, 110.
22. Wagner, C. D.; Naumkin, A. V.; Kraut-Vass, A.; Allison, J. W.; Powell, C. J.; Rumble, J. R., Jr. NISTX-ray Photoelectron Spectroscopy Database, version 3.3 (web version); 2003; http://srdata.nist.gov/xps/.
23. Tang, C.; Georgopoulos, P.; Fine, M. E.; Cohen, J. B.; Nygren, M.; Knapp G. S.; Aldred, A. Phys. Rev. B 1985, 31, 1000.
24. Beteille, F.; Mazerolles, L.; Livage, J. Mater. Res. Bull. 1999, 34, 2177.