MOCVD of vanadium oxide films with a novel vanadium(III) precursor

Chemical Vapor Deposition

Volumn 17, Issue 1-3, 2011, Pages 6-8

  Crociani, Laura ^a   Carta, Giovanni ^a   Natali, Marco ^a   Rigato, Valentino ^b   Rossetto, Gilberto ^a  

^a CNR   (Italy)

^b LABORATORI NAZIONALI DI LEGNARO   (Italy)

Author keywords

MOCVD; Thin films; Vanadium dioxide

Indexed keywords

ALKOXIDES; MOCVD; MOCVD PRECURSORS; VANADIUM DIOXIDE; VANADIUM OXIDE FILMS;

CYCLIC VOLTAMMETRY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS; VAPOR DEPOSITION; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 79952768687     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.201004291     Document Type: Article

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