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Journal of Applied Physics

Volumn 102, Issue 7, 2007, Pages

X-ray diffraction studies of the growth of vanadium dioxide nanoparticles

(6) Pauli, S A a Herger, R a Willmott, P R a Donev, E U b Suh, J Y b Haglund Jr , R F b

a PAUL SCHERRER INSTITUTE (Switzerland)

b VANDERBILT UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; EPITAXIAL FILMS; EPITAXIAL GROWTH; LATTICE MISMATCH; NANOPARTICLES; PULSED LASER DEPOSITION; SINGLE CRYSTALS; X RAY DIFFRACTION;

METAL INSULATOR TRANSITIONS; OPTICAL MEASUREMENTS; SILICON SUBSTRATES; THERMAL ANNEALING; VANADIUM DIOXIDES;

VANADIUM COMPOUNDS;

EID: 35348849077 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2786917 Document Type: Article

Times cited : (39)

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