Resistance switching in electrodeposited VO2 thin films

Chemistry of Materials

Volumn 23, Issue 18, 2011, Pages 4105-4108

  Koza, Jakub A ^a   He, Zhen ^a   Miller, Andrew S ^a   Switzer, Jay A ^a  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

electrodeposition; metal to insulator transition; resistance switching; Vanadium dioxide

Indexed keywords

ELECTRODEPOSITION METHODS; FIELD EFFECTS; LOW CURRENTS; METAL-TO-INSULATOR TRANSITIONS; RESISTANCE SWITCHING; ROOM TEMPERATURE; SHARP RESISTANCE; SOLID-STATE MEMORY; TRIETHANOLAMINES; ULTRA-FAST; VANADIUM DIOXIDE;

ELECTRODEPOSITION;

METAL INSULATOR TRANSITION;

EID: 80052974591     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm2019394     Document Type: Article

References (27)

1. Morin, F. J. Phys. Rev. Lett. 1959, 3, 34-36
2. Jones, A. C.; Berweger, S.; Wei, J.; Cobden, D.; Raschke, M. B. Nano Lett. 2010, 10, 1574-1581
3. Sohn, J. I.; Joo, H. J.; Ahn, D.; Lee, H. H.; Porter, A. E.; Kim, K.; Kang, D. J.; Welland, M. E. Nano Lett. 2009, 9, 3392-3397
4. Yang, Z.; Ko, C.; Ramanathan, S. Annu. Rev. Mater. Res. 2011, 41, 337-367
5. Baum, P.; Yang, D.-S.; Zewail, A. H. Science 2007, 318, 788-792
6. Hyun-Tak, K.; Byung-Gyu, Ch; Doo-Hyeb, Y; Sung-Lyul, M; Gyungock, K; Kwang-Yong, K.; Yong-Sik, L. New J. Phys. 2004, 6, 52
7. Driscoll, T.; Kim, H. T.; Chae, B. G.; Di Ventra, M.; Basov, D. N. Appl. Phys. Lett. 2009, 95, 043503
8. Cezar, A. B.; Graff, I. L.; Rikers, Y.; Schreiner, W. H.; Mattoso, N. Electrochem. Solid-State Lett. 2011, 14, D23-D25
9. Deligianni, H.; Romankiw, L. T. IBM J. Res. Dev. 1993, 37, 85-94
10. Koza, J. A.; Uhlemann, M.; Gebert, A.; Schultz, L. J. Electroanal. Chem. 2008, 617, 194-202
11. Handbook of X-ray Photoelectron Spectroscopy; Chastain, J., Ed.; Perkin-Elmer Corporation: Eden Prairie, MN, 1992.
12. Silversmit, G.; Depla, D.; Poelman, H.; Marin, G. B.; De Gryse, R. J. Electron Spectrosc. Relat. Phenom. 2004, 135, 167-175
13. Huang, C.-M.; Hu, C.-C.; Chang, K.-H.; Li, J.-M.; Li, Y.-F. J. Electrochem. Soc. 2009, 156, A667-A671
14. Li, J.-M.; Chang, K.-H.; Hu, C.-C. Electrochim. Acta 2010, 55, 8600-8605
15. Piccirillo, C.; Binions, R.; Parkin, I. P. Chem. Vap. Deposition 2007, 13, 145-151
16. Pan, M.; Liu, J.; Zhong, H.; Wang, S.; Li, Z.-F.; Chen, X.; Lu, W. J. Cryst. Growth 2004, 268, 178-183
17. Gurvitch, M.; Luryi, S.; Polyakov, A.; Shabalov, A.; Dudley, M.; Wang, G.; Ge, S.; Yakovlev, V. J. Appl. Phys. 2007, 102, 033504
18. Zhang, S.; Chou, J. Y.; Lauhon, L. J. Nano Lett. 2009, 9, 4527-4532
19. Ramírez, J.-G.; Sharoni, A.; Dubi, Y.; Gómez, M. E.; Schuller, I. K. Phys. Rev. B 2009, 79, 235110
20. Yang, Z.; Ko, C.; Balakrishnan, V.; Gopalakrishnan, G.; Ramanathan, S. Phys. Rev. B 2010, 82, 205101
21. Yang, Z.; Ko, C.; Ramanathan, S. J. Appl. Phys. 2010, 108, 073708
22. Griffiths, C. H.; Eastwood, H. K. J. Appl. Phys. 1974, 45, 2201-2206
23. Chudnovskii, F. A.; Stefanovich, G. B. J. Solid State Chem. 1992, 98, 137-143
24. Stefanovich, G. B.; Pergament, A. L.; Velichko, A. A.; Stefanovich, L. A. J. Phys.: Condens. Matter 2004, 16, 4013-4024
25. Wu, J.; Gu, Q.; Guiton, B. S.; de Leon, N. P.; Ouyang, L.; Park, H. Nano Lett. 2006, 6, 2313-2317
26. Goodenough, J. B. J. Solid State Chem. 1971, 3, 490-500
27. Moffat, T. P.; Wheeler, D.; Huber, W. H.; Josell, D. Electrochem. Solid-State Lett. 2001, 4, C26-C29