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Journal of Non-Crystalline Solids

Volumn 362, Issue 1, 2013, Pages 34-39

Low-temperature crystallization and hardness enhancement of alumina films using the resputtering technique

(5) Zhang, Xiaopeng a Zhu, Jiaqi a Zhang, Lixia b Han, Jiecai a Du, Shanyi a

a HARBIN INSTITUTE OF TECHNOLOGY (China)

b AIR FORCE ENGINEERING UNIVERSITY (China)

Author keywords

Crystalline alumina films; Deposition temperature; Hardness; Resputtering; Substrate bias

Indexed keywords

ALUMINA FILMS; ALUMINA THIN FILMS; AMORPHOUS LAYER; DEPOSITION TEMPERATURES; ELEVATED TEMPERATURE; GAS FLOWRATE; GRAZING-INCIDENCE X-RAY DIFFRACTION; HARDNESS ENHANCEMENT; HARDNESS VALUES; LOW TEMPERATURES; LOW-TEMPERATURE CRYSTALLIZATION; MONOTONIC FUNCTIONS; RE-SPUTTERING; REACTIVE MAGNETRON SPUTTERING; SI (100) SUBSTRATE; SUBSTRATE BIAS; VARIOUS SUBSTRATES;

ALUMINA; ALUMINUM; CRYSTALLINE MATERIALS; DEPOSITS; HARDNESS; ION SOURCES; MAGNETRON SPUTTERING; NANOHARDNESS; SUBSTRATES; TEMPERATURE; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 84871769543 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2012.11.016 Document Type: Article

Times cited : (19)

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