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Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2357-2362

Ion beam processing of sapphire single crystals

(5) Alves, E a Marques, C a da Silva, R C a Monteiro, T b McHargue, C c

a INSTITUTO TECNOLÓGICO E NUCLEAR (Portugal)

b UNIVERSITY OF AVEIRO (Portugal)

c UNIVERSITY OF TENNESSEE (United States)

Author keywords

Al2O3; Ion implantation; Nanoparticles; Optical and magnetic properties

Indexed keywords

ABSORPTION BANDS; ANNEALING ATMOSPHERES; AXIAL CHANNELINGS; CLUSTERING PROCESS; CO PRECIPITATES; CONTINUOUS DISTRIBUTIONS; FLUENCES; IMPLANTED SAMPLES; ION-BEAM PROCESSING; MATRIXES; MICROSCOPIC PROCESS; NANO-PRECIPITATES; NEAR SURFACES; NEW STRUCTURES; NOBLE METALS; OPTICAL ABSORPTION MEASUREMENTS; OPTICAL AND MAGNETIC PROPERTIES; OSTWALD RIPENING MECHANISMS; PLASMON RESONANCE ABSORPTIONS; ROOM TEMPERATURES; SAPPHIRE SINGLE CRYSTALS; VISIBLE RANGES; XRD ANALYSIS;

ABSORPTION; ALUMINUM; CLUSTERING ALGORITHMS; CORUNDUM; CRYSTAL GROWTH; ION BOMBARDMENT; ION IMPLANTATION; MAGNETIC PROPERTIES; NANOPARTICLES; OSTWALD RIPENING; PRECIOUS METALS; SAPPHIRE; SODIUM COMPOUNDS; SURFACE PROPERTIES;

SINGLE CRYSTALS;

EID: 67349249990 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.02.037 Document Type: Article

Times cited : (8)

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