Texture and microstructure of Cr2O3and (Cr,Al)2O3thin films deposited by reactive inductively coupled plasma magnetron sputtering

Thin Solid Films

Volumn 518, Issue 15, 2010, Pages 4294-4298

  Pedersen, K ^a   Bottiger J ^a   Sridharan, M ^a,c   Sillassen, M ^a   Eklund, P ^a,b  

^a AARHUS UNIVERSITY   (Denmark)

^b LINKÖPING UNIVERSITY   (Sweden)

^c SASTRA UNIVERSITY   (India)

Author keywords

Alumina; Chromia; Coatings; Physical vapor deposition; Preferred orientation; X ray diffraction

Indexed keywords

ALUMINUM; COATINGS; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PHOTORESISTS; PHYSICAL VAPOR DEPOSITION; TEXTURES; X RAY DIFFRACTION;

APPLIED BIAS; CHROMIA; CHROMIA COATINGS; CODEPOSITION; COMPETITIVE GROWTH; FIBER TEXTURE; INDUCED STRAIN; METASTABLE SOLID SOLUTION; OUT-OF-PLANE TEXTURES; PREFERRED ORIENTATION; PREFERRED ORIENTATIONS; RECRYSTALLIZATIONS; REDUCED ELASTIC MODULUS; SUBSTRATE TEMPERATURE;

CHROMIUM;

ALUMINUM; ALUMINUM OXIDE; CHROMIUM; COATINGS; ELECTROMAGNETIC INDUCTION; GROWTH; IONS; MICROSTRUCTURE; ORIENTATION; PLASMA; TEXTURE; X RAY DIFFRACTION;

EID: 77953138467     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.008     Document Type: Article

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