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Applied Physics Letters

Volumn 101, Issue 22, 2012, Pages

Femtosecond laser direct hard mask writing for selective facile micron-scale inverted-pyramid patterning of silicon

(5) Kumar, K a Lee, K K C a Herman, P R a Nogami, J a Kherani, N P a

a UNIVERSITY OF TORONTO (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SILICONS; FEMTOSECOND (FS) LASER; FS-LASER; HARD MASKS; KOH ETCHING; M-SCALE; MICRON SCALE; NON-CONTACT; PHOTOVOLTAICS; SELECTIVE REMOVAL; SINGLE PULSE; SYSTEMATIC EXPERIMENT;

ANISOTROPIC ETCHING; POTASSIUM HYDROXIDE; SILICON; SILICON NITRIDE; ULTRAFAST LASERS;

SILICON WAFERS;

EID: 84870494678 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4768689 Document Type: Article

Times cited : (31)

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