Honeycomb texturing of silicon via nanoimprint lithography for solar cell applications

IEEE Journal of Photovoltaics

Volumn 2, Issue 2, 2012, Pages 114-122

  Hauser, Hubert ^a   Michl, Bernhard ^a   Schwarzkopf, Sebastian ^a   Kübler, Volker ^a   Müller, Claas ^b   Hermle, Martin ^a   Bläsi, Benedikt ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b Institute for Microsystems Engineering   (Germany)

Author keywords

Microstructures; photovoltaic cells; silicon; surface texture

Indexed keywords

CURABLE POLYMERS; ETCHING MASKS; FLOAT ZONES; HIGH QUALITY; HIGH-THROUGHPUT; IN-LINE; INTERFERENCE LITHOGRAPHY; MULTI-CRYSTALLINE SILICON SOLAR CELLS; OPTICAL MEASUREMENT; POLYMER LAYERS; PROCESS CHAIN; REFLECTION MEASUREMENTS; SILICON SUBSTRATES; SOLAR-CELL APPLICATIONS; SURFACE TEXTURES; TEXTURED SUBSTRATES; ULTRA-VIOLET; WET CHEMICALS; WHOLE PROCESS;

HONEYCOMB STRUCTURES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OPTICAL DATA PROCESSING; PHOTOVOLTAIC CELLS; PLASMA ETCHING; POLYSILICON; SILICON; TEXTURES; WET ETCHING;

NANOIMPRINT LITHOGRAPHY;

EID: 84865175352     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2012.2184265     Document Type: Article

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