Processes for over 18.5% high-efficiency multi-crystalline silicon solar cell

Current Applied Physics

Volumn 10, Issue 2 SUPPL., 2010, Pages

  Morikawa, Hiroaki ^a   Niinobe, Daisuke ^a   Nishimura, Kunihiko ^a   Matsuno, Shigeru ^a   Arimoto, Satoshi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Honeycomb texture; Hydrogen passivation; Multi crystalline silicon solar cell; Rapid firing

Indexed keywords

CELL STRUCTURE; FABRICATION PROCESS; GRID ELECTRODES; HIGH EFFICIENCY; HYDROGEN PASSIVATION; LASER PATTERNING; MASS PRODUCTION; METAL ELECTRODE MATERIALS; METAL ELECTRODES; METALLIZATION PROCESS; MULTI-CRYSTALLINE SILICON; MULTI-CRYSTALLINE SILICON SOLAR CELL; MULTI-CRYSTALLINE SILICON SOLAR CELLS; NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY; SI WAFER; TEXTURIZATION; WET-CHEMICAL ETCHING;

CRYSTALLINE MATERIALS; ELECTROCHEMICAL ELECTRODES; HONEYCOMB STRUCTURES; PASSIVATION; SEMICONDUCTOR QUANTUM DOTS; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR CELLS; SOLAR POWER GENERATION; STRUCTURAL OPTIMIZATION; TEXTURES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77949569793     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.11.003     Document Type: Article

References (10)

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