Role of a native oxide on femtosecond laser interaction with silicon (100) near the damage threshold

Applied Physics Letters

Volumn 86, Issue 26, 2005, Pages 1-3

  McDonald, Joel P ^a   McClelland, Arthur A ^a   Picard, Yoosuf N ^a   Yalisove, Steven M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATED REGIONS; AVERAGE POWER; NATIVE OXIDES; WAVELENGTHS;

ATOMIC FORCE MICROSCOPY; MACHINING; MORPHOLOGY; OPTICAL MICROSCOPY; OXIDES; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SILICON; ULTRAHIGH VACUUM;

LASER DAMAGE;

EID: 22144459046     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1946916     Document Type: Article

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