Optimum aberration coefficients for recording high-resolution off-axis holograms in a Cs-corrected TEM

Ultramicroscopy

Volumn 124, Issue , 2013, Pages 77-87

  Linck, Martin ^a  

^a CEOS GmbH   (Germany)

Author keywords

Aberrations; Atomic resolution; Cs correction; Holography; Optimum defocus; Simulation

Indexed keywords

ABERRATION COEFFICIENTS; ABERRATION CORRECTION; ABERRATION-CORRECTED; ATOMIC POSITIONS; ATOMIC RESOLUTION; BRUTE FORCE; CS-CORRECTION; DEFOCUS; DEGREE OF FREEDOM; HIGH RESOLUTION; IMAGE INTENSITIES; LOCAL SIGNAL; OFF-AXIS; OFF-AXIS ELECTRON HOLOGRAPHY; OFF-AXIS HOLOGRAPHY; OPTIMUM VALUE; PHASE SIGNALS; PHASE-CONTRAST IMAGING; RECONSTRUCTABLE; RECONSTRUCTED OBJECTS; SIGNAL RESOLUTION; SIGNAL TO NOISE; SIMULATION; SIMULATION STUDIES; SPHERICAL ABERRATIONS;

ABERRATIONS; ATOMS; CESIUM; ELECTRON HOLOGRAPHY; HARDWARE; HOLOGRAPHY;

HOLOGRAMS;

CESIUM;

ARTICLE; COMPUTER; CONTROLLED STUDY; ELECTRON MICROSCOPE; HOLOGRAM; IMAGE PROCESSING; IMAGE QUALITY; IMAGE RECONSTRUCTION; IMAGING; INTERMETHOD COMPARISON; PROCESS OPTIMIZATION; SIGNAL NOISE RATIO; SIMULATION; STATISTICAL ANALYSIS; TRANSMISSION ELECTRON MICROSCOPE; HOLOGRAPHY; IMAGE ANALYSIS; IMAGE DISPLAY; IMAGE INTENSIFIER; IMAGING SYSTEM; MATHEMATICAL COMPUTING; MATHEMATICAL MODEL; PHASE CONTRAST MICROSCOPY; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY; ELECTRON; ELECTRON MICROSCOPY; METHODOLOGY;

ELECTRONS; HOLOGRAPHY; MICROSCOPY, ELECTRON; SIGNAL-TO-NOISE RATIO;

EID: 84868548439     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2012.08.006     Document Type: Article

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