Optimum HRTEM image contrast at 20kV and 80kV-Exemplified by graphene

Ultramicroscopy

Volumn 112, Issue 1, 2012, Pages 39-46

  Lee, Z ^a   Meyer, J C ^a,b   Rose, H ^a   Kaiser, U ^a  

^a UNIVERSITY OF ULM   (Germany)

^b UNIVERSITY OF VIENNA   (Austria)

Author keywords

Chromatic aberration; Elastic scattering; Graphene; Low voltage; Phase object approximation

Indexed keywords

DENSITY FUNCTIONAL THEORY; ELASTIC SCATTERING; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; ENERGY DISSIPATION; GRAPHENE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IMAGE ENHANCEMENT;

ABERRATION-CORRECTED; ADJUSTABLE PARAMETERS; CHROMATIC ABERRATION; CHROMATIC ABERRATION COEFFICIENTS; CHROMATIC ABERRATION CORRECTION; ENERGY DISTRIBUTIONS; LOW VOLTAGES; PHASE OBJECT;

ABERRATIONS;

GRAPHENE; ROFLUFOCON;

ARTICLE; CONTRAST ENHANCEMENT; ELECTRON ENERGY LOSS SPECTROSCOPY; IMAGE ANALYSIS; IMAGE DISPLAY; PROCESS OPTIMIZATION; TRANSMISSION ELECTRON MICROSCOPY;

EID: 81055138199     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2011.10.009     Document Type: Article

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