Aberration correction and electron holography

Microscopy and Microanalysis

Volumn 16, Issue 4, 2010, Pages 434-440

  Lichte, Hannes ^a   Linck, Martin ^a   Geiger, Dorin ^a   Lehmann, Michael ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

aberration correction; atomic resolution; electron holography; phase contrast; phase detection limit; signal to noise ratio; TEM

Indexed keywords

EID: 77957223973     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927610093633     Document Type: Conference Paper

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