Particle-in-cell simulations of hollow cathode enhanced capacitively coupled radio frequency discharges

Physics of Plasmas

Volumn 19, Issue 2, 2012, Pages

  Lafleur, T ^a   Boswell, R W ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AREA RATIOS; CAPACITIVE VOLTAGE DIVIDERS; CAPACITIVELY COUPLED; CAPACITIVELY COUPLED RF DISCHARGE; DENSITY ENHANCEMENT; ELECTRODE CONFIGURATIONS; HEATING MECHANISMS; HOLLOW CATHODE DISCHARGE; HOLLOW CATHODE EFFECT; HOLLOW CATHODES; PARTICLE-IN-CELL SIMULATIONS; POWER DEPOSITION; RADIO FREQUENCY DISCHARGES; SECONDARY ELECTRON EMISSIONS; SECONDARY ELECTRONS; VOLTAGE DROP;

CATHODES; GROUNDING ELECTRODES; ION BOMBARDMENT; PARTICLE BEAM DYNAMICS; PLASMA SHEATHS; SECONDARY EMISSION; VOLTAGE DIVIDERS;

ELECTRIC DISCHARGES;

EID: 84857853126     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3685709     Document Type: Article

References (38)

1. L. Brdos, Surf. Coat. Technol. 86-87, 648 (1996). 10.1016/S0257-8972(96) 03056-3
2. L. Brdos, H. Barnkov, and S. Berg, Surf. Coat. Technol. 97, 723 (1997). 10.1016/S0257-8972(97)00291-0
3. J. V. Sullivan and A. Walsh, Spectrochim. Acta 21, 721 (1965). 10.1016/0371-1951(65)80027-3
4. D. M. Goebel and I. Katz, Fundamentals of Electric Propulsion: Ion and Hall Thrusters (John Wiley Sons, New Jersey, 2008).
5. M. C. Storrie-Lombardi, W. F. Hug, G. D. McDonald, A. I. Tsapin, and K. H. Nealson, Rev. Sci. Instrum. 72, 4452 (2001). 10.1063/1.1369627
6. R. M. Sankaran and K. P. Giapis, J. Appl. Phys. 92, 2406 (2002). 10.1063/1.1497719
7. L. Brdos, S. Berg, and H. O. Blom, Appl. Phys. Lett. 55, 1615 (1989). 10.1063/1.102215
8. M. Mildner, D. Korzec, and J. Engemann, Surf. Coat. Technol. 112, 366 (1999). 10.1016/S0257-8972(98)00778-6
9. H. Barnkov and L. Brdos, Surf. Coat. Technol. 146-147, 486 (2001). 10.1016/S0257-8972(01)01376-7
10. H. S. Lee, Y. S. Lee, S. H. Seo, and H. Y. Chang, Thin Solid Films 519, 6955 (2011). 10.1016/j.tsf.2011.04.139
11. H. S. Lee, Y. S. Lee, S. H. Seo, and H. Y. Chang, Appl. Phys. Lett. 97, 081503 (2010). 10.1063/1.3480409
12. V. I. Kolobov and L. D. Tsendin, Plasma Sources Sci. Technol. 4, 551 (1995). 10.1088/0963-0252/4/4/006
13. R. R. Arslanbekov, A. A. Kudryavtsev, and R. C. Tobin, Plasma Sources Sci. Technol. 7, 310 (1998). 10.1088/0963-0252/7/3/009
14. P. Gessini, S. B. Gabriel, and D. G. Fearn, in 27th International Electric Propulsion Conference, Pasadena California, 15-19 October, IEPC-01-233 (Electric Rocket Propulsion Society, Ohio, 2001).
15. R. A. Arakoni, J. J. Ewing, and M. J. Kushner, J. Phys. D: Appl. Phys. 41, 105208 (Electric Rocket Propulsion Society, Ohio, 2008). 10.1088/0022-3727/41/10/105208
16. P. S. Kothnur and L. L. Raja, J. Appl. Phys. 97, 043305 (2005). 10.1063/1.1849816
17. J. P. Boeuf, L. C. Pitchford, and K. H. Schoenbach, Appl. Phys. Lett. 86, 071501 (2005). 10.1063/1.1862781
18. N. Baguer, A. Bogaerts, Z. Donko, R. Gijbels, and N. Sadeghi, J. Appl. Phys. 97, 123305 (2005). 10.1063/1.1929857
19. C.K. Birdsall and A. B. Langdon, Plasma Physics Via Computer Simulation (McGraw-Hill, New York, 1985).
20. G. J. Kim, F. Iza, and J. K. Lee, J. Phys. D: Appl. Phys. 39, 4386 (2006). 10.1088/0022-3727/39/20/014
21. Y. Miyagawa, H. Nakadate, M. Tanaka, M. Ikeyama, and S. Miyagawa, Surf. Coat. Technol. 186, 2 (2004). 10.1016/j.surfcoat.2004.04.043
22. G. J. Kim and J. K. Lee, IEEE Trans. Plasma Sci. 36, 1238 (2008). 10.1109/TPS.2008.920314
23. V. Vahedi and M. Surendra, Comp. Phys. Commun. 87, 179 (1995). 10.1016/0010-4655(94)00171-W
24. M. Hayashi, J. Phys. D 15, 1411 (1982). 10.1088/0022-3727/15/8/012
25. J. Ferch, B. Granitza, C. Masche, and W. Raith, J. Phys. B 18, 967 (1985). 10.1088/0022-3700/18/5/017
26. F. J. de Heer, R. H. J. Jansen, and W. van der Kaay, J. Phys. B 12, 979 (1979). 10.1088/0022-3700/12/6/016
27. E. Krishnakumar and S. K. Srivastava, J. Phys. B 21, 1055 (1988). 10.1088/0953-4075/21/6/014
28. A. V. Phelps, J. Appl. Phys. 76, 747 (1994). 10.1063/1.357820
29. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (John Wiley Sons, New Jersey, 2005).
30. H. Y. Chang, private communication (2011).
31. V. Vahedi and G. DiPeso, J. Comput. Phys. 131, 149 (1997). 10.1006/jcph.1996.5591
32. E. Kawamura, C. K. Birdsall, and V. Vahedi, Plasma Sources Sci. Technol. 9, 413 (2000). 10.1088/0963-0252/9/3/319
33. L. Brdos and N. Q. Vu, Czech. J. Phys. B 39, 735 (1989).
34. D. Vender and R.W. Boswell, IEEE Trans. Plasma Sci. 18, 725 (1990). 10.1109/27.57527
35. M. Surendra and D. B. Graves, IEEE Trans. Plasma Sci. 19, 144 (1991). 10.1109/27.106808
36. D.J. Griffiths, Introduction to Electrodynamics, 3rd ed. (Prentice-Hall, New Jersey, 1999).
37. V. Vahedi, G. DiPeso, C.K. Birdsall, M. A. Lieberman, and T. D. Rognlien, Plasma Sources Sci. Technol. 2, 261 (1993). 10.1088/0963-0252/2/4/006
38. C. M. O. Mahony, T. Gans, W. G. Graham, P. D. Maguire, and Z. Lj. Petrovi, Appl. Phys. Lett. 93, 011501 (2008). 10.1063/1.2956412