Influence of ionization degree on film properties when using high power impulse magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 3, 2012, Pages

  Samuelsson, Mattias ^a,b   Lundin, Daniel ^a   Sarakinos, Kostas ^a   Björefors, Fredrik ^c   Wälivaara, Bengt ^b   Ljungcrantz, Henrik ^b   Helmersson, U ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Impact Coatings   (Sweden)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE POWER; CHROMIUM THIN FILMS; DEGREE OF IONIZATION; DEPOSITION FLUXES; DEPOSITION TECHNIQUE; DIRECT CURRENT MAGNETRON SPUTTERING; FILM PROPERTIES; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); INDUSTRIAL DEPOSITION SYSTEMS; ION ENERGY DISTRIBUTION FUNCTIONS; IONIZATION DEGREE; POWER FRACTION; TOTAL POWER;

DEPOSITION RATES; IONIZATION; MAGNETRON SPUTTERING; METAL IONS;

ELECTRIC PROPERTIES;

EID: 84864236404     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3700227     Document Type: Article

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