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Journal of Crystal Growth

Volumn 205, Issue 3, 1999, Pages 441-452

Application of rate equations to describe nucleation and growth on rough substrates: tin and lead on aluminium

(1) Eisenmenger Sittner, C a

a VIENNA UNIVERSITY OF TECHNOLOGY (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; LEAD; MAGNETRON SPUTTERING; NUCLEATION; REACTION KINETICS; SURFACE ROUGHNESS; THIN FILMS; TIN; VAPOR DEPOSITION;

KINETICS OF GROWTH; KINETICS OF NUCLEATION; RATE EQUATIONS;

CRYSTAL GROWTH;

EID: 0032598129 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(99)00291-2 Document Type: Article

Times cited : (15)

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