Effects of thermal treatment on the characteristics of boron and tantalum-doped ZnO thin films deposited by the electrospraying method at atmospheric pressure

Surface and Coatings Technology

Volumn 206, Issue 23, 2012, Pages 4730-4740

  Mahmood, Khalid ^a   Song, Dongsu ^a   Park, Seung Bin ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Annealing; Crystallinity; Electrospraying; Resistivity; Transmittance; Zinc oxide

Indexed keywords

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; AS-DEPOSITED THIN FILMS; BORON-DOPED; CRYSTALLINE STRUCTURE; CRYSTALLINITIES; DOPANT CONCENTRATIONS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTROSPRAYING; HEATED GLASS SUBSTRATES; HIGH RESISTIVITY; INDIUM TIN OXIDE; IONIC RADIUS; LOW RESISTIVITY; METAL-DOPED; MINIMUM VALUE; OPTIMAL DOPING; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; PRESENT VALUE; RESISTIVITY VALUES; STARTING SOLUTIONS; TRANSMITTANCE; VISIBLE REGION; ZNO FILMS; ZNO THIN FILM;

ANNEALING; ATMOSPHERIC PRESSURE; CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; FILM PREPARATION; METAL ANALYSIS; METALLIC FILMS; OPACITY; OPTICAL FILMS; SEMICONDUCTOR DOPING; TANTALUM; TIN; TIN OXIDES; ZINC OXIDE;

INDIUM COMPOUNDS;

EID: 84863783913     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.01.047     Document Type: Article

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