Electrostatic spray deposited polycrystalline zinc oxide films for ultraviolet luminescence device applications

Journal of Alloys and Compounds

Volumn 481, Issue 1-2, 2009, Pages 735-739

  Li, Jin ^a   Fan, Huiqing ^a   Jia, Xiaohua ^a   Chen, Jin ^a   Cao, Zhiyi ^b   Chen, Xiaopeng ^b  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Luminescence; Optical properties; Semiconductors

Indexed keywords

DEEP LEVEL EMISSION; DEVICE APPLICATION; ELECTROSTATIC SPRAY; ELECTROSTATIC SPRAY DEPOSITION; ENERGY DISPERSIVE X RAY SPECTROSCOPY; NEAR BAND EDGE EMISSIONS; OXIDE NANOCRYSTALS; POLYCRYSTALLINE FILM; POLYCRYSTALLINE ZINC OXIDES; ROOM TEMPERATURE PHOTOLUMINESCENCE SPECTRA; SCANNING ELECTRON MICROSCOPE; SEMICONDUCTORS; SOLUTION PRECURSOR; STRUCTURE AND PROPERTIES; TEMPERATURE DEPENDENCE; ULTRAVIOLET LUMINESCENCE; ZNO FILMS;

AMORPHOUS MATERIALS; DEPOSITS; ELECTROSTATICS; EMISSION SPECTROSCOPY; LIGHT; LIGHT EMISSION; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING ZINC COMPOUNDS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 67649300732     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.03.094     Document Type: Article

References (29)

1. Cho S., Ma J., Kim Y., Sun Y., Wong K.L., and Ketterson J.B. Appl. Phys. Lett. 75 (1999) 2761
2. Soki T., Hatanaka Y., and Look D.C. Appl. Phys. Lett. 76 (2000) 3257
3. Berber M., Bulto V., Kliß R., and Hahn H. Scripta Mater. 53 (2005) 547
4. Bagnall D.M., Chen Y.F., Zhu Z., Yao T., Koyama S., Shen M., and Goto T. Appl. Phys. Lett. 70 (1997) 2230
5. Cao H., Zhao Y.G., Ong H.C., Ho S.T., Dai J.Y., Wu J.Y., and Chang R.P.H. Appl. Phys. Lett. 73 (1998) 3656
6. Huang M., Mao S., Feick H., Yan H., Wu Y., Kind H., Weber E., Russo R., and Yang P. Science 292 (2001) 1897
7. Bethke S., Pan H., and Wesseis B.W. Appl. Phys. Lett. 52 (1988) 138
8. Chen Y., Bagnall D.M., Koh H.J., Park K.T., Hiraga K., Zhu Z., and Yao T. J. Appl. Phys. 84 (1998) 3912
9. Ma J., Ji F., Zhang D.H., Ma H.L., and Li S.Y. Thin Solid Films 357 (1999) 98
10. Chi D.H., Binh L.T.T., Binh N.T., Khanh L.D., and Long N.N. Appl. Surf. Sci. 252 (2006) 2770
11. Ryu C.K., and Kim K. Appl. Phys. Lett. 67 (1995) 3337
12. Jiang W.P., Malshe A.P., and Brown W.D. Surf. Coat. Technol. 177-178 (2004) 671
13. Lu J., Chu J., Huang W., and Ping Z. Jpn. J. Appl. Phys. 41 (2002) 4317
14. Chen X.P., Cheng J.S., and Yin X.Z. Chin. Sci. Bull. 48 (2003) 1
15. Tang Z.K., Wong G.K.L., Yu P., Kawasaki M., Ohtomo A., Koinuma H., and Segawa Y. Appl. Phys. Lett. 72 (1998) 3270
16. Tang Z., Zhang Z., Wang Y., Glotzer S.C., and Koto N.A. Science 314 (2006) 274
17. Dai L., Chen X.L., Wang X.J., Zhou T., and Hu B.Q. J. Phys.: Condens. Matter 15 (2003) 2221
18. Fu Z., Lin B., Liao G., and Wu Z. J. Cryst. Growth 193 (1998) 316
19. Vanheusden K., Warren W.L., Seager C.H., Tallant D.R., Voigt J.A., and Gnade B.E. J. Appl. Phys. 79 (1996) 7983
20. Cui J., and Gibson U. Phys. Rev. B 74 (2006) 045416
21. Teke A., Özgür U., Dogan S., Gu X., and Morkoç H. Phys. Rev. B 70 (2004) 195207
22. Zhang B.P., Binh N.T., Segawa Y., Wakatsuki K., and Usami N. Appl. Phys. Lett. 83 (2003) 1635
23. As D.J., Schmilgus F., Wang C., Schöttker B., Schikora D., and Lischka K. Appl. Phys. Lett. 70 (1997) 1311
24. Wang J.F., Masugata D., Oh C.B., Omino A., Seto S., and Isshiki M. Phys. Status Solidi A 193 (2002) 251
25. Varshni Y.P. Physica 34 (1967) 149
26. Hutson A.R. J. Phys. Chem. Solids 8 (1959) 467
27. Ryu Y.R., Lee T.S., and White H.W. Appl. Phys. Lett. 83 (2003) 87
28. Xiu F.X., Yang Z., Mandalapu L.J., Zhao D.T., Liu J.L., and Beyermann W.P. Appl. Phys. Lett. 87 (2005) 152101
29. Hümmer K. Phys. Status Solidi 56 (1973) 249