Structural and optical properties of sputtered ZnO films

Thin Solid Films

Volumn 348, Issue 1, 1999, Pages 165-172

  Bachari, E M ^a   Baud, G ^a   Ben Amor, S ^a   Jacquet, M ^a  

^a UNIVERSITÉ CLERMONT AUVERGNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; COMPOSITION; COMPRESSIVE STRESS; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXYGEN; PARTIAL PRESSURE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRESS RELAXATION; ZINC OXIDE;

ATOMIC RATIO; CRYSTALLINITY; POST DEPOSITION HEAT TREATMENT; PREFERRED ORIENTATION; STRUCTURAL PROPERTIES; WURTZITE;

THIN FILMS;

EID: 0032652792     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00060-7     Document Type: Article

References (32)

1. Brett M.J., Parsons R.R., Baltes H.P. Appl. Opt. 25:1986;2712.
2. Schropp R.E.I., Madan A. J. Appl. Phys. 66:1989;2027.
3. Blom F.R., Van de Pol F.C.M., Bauhuis G., Popma T.J.A. Thin Solid Films. 204:1991;365.
4. Ito K., Nakazawa T. Jpn. J. Appl. Phys. 22:1983;L245.
5. F.S. Hickernell, IEEE Ultrasonics Symposium Proceedings, Vol. 1, 1980.
6. Hickernell F.S. J. Appl. Phys. 44:1973;1061.
7. Yakub B.T.K., Kino G.S., Galle P. J. Appl. Phys. 46:1975;3266.
8. Devaney W.E., Chen W.S., Stewart J.M., Mickelsen R.A. IEEE Trans. Electron Devices. 37:1990;428.
9. Ben Amor S., Baud G., Jacquet M., Pichon N. Surf. Coat. Technol. 102:1998;63.
10. Shimuzu M., Shiosaki T., Kawata A. J. Cryst. Growth. 57:1982;94.
11. Proscia J., Gordon R.G. Thin Solid Films. 214:1992;175.
12. Kim J.S., Marzouk H.A., Reucroft P.J. Thin Solid Films. 217:1992;133.
13. Swamy H.G., Reddy P.J. Semicond. Sci. Technol. 5:1990;980.
14. Watanabe H. Jpn. J. Appl. Phys. 9:1970;418.
15. Reddy P.S. Solid State Commun. 77:1991;899.
16. Silver A.T., Jonbert J.C., Labean M.L. Thin Solid Films. 197:1991;19.
17. Nobbs J.M., Gillespie F.C. J. Phys. Chem. Solids. 31:1970;2353.
18. J.F. Guillemoles, D. Lincont, P. Cowache, J. Vedel, 10th European Photovoltaic Solar Energy Conf., 1991, p. 609.
19. W.K. Chu, J.W. Mayer, M.A. Nicolet, Backscattering Spectrometry, Academic Press, New York, 1978.
20. Swanepoel R. J. Phys. E. 16:1983;12134.
21. Winters H.F., Sigmund P. J. Appl. Phys. 45:1974;4760.
22. R.W.G. Wyckoff, Crystal Structures, Vol. 1, Interscience, New York, 1960, p. 19.
23. Jacobshon E., Shechtman D. Mater. Res. Soc. Symp. Proc. 242:1992;779.
24. Krupanidhi S.B., Sayer M. J. Appl. Phys. 56:1984;3308.
25. Meng L.J., dos Santos M.P. Thin Solid Films. 250:1994;26.
26. B.D. Cullity, Elements of X-Ray Diffraction, 2nd edn., Addison Wesley, Reading, MA, 1978.
27. Sundaram K.B., Khan A. Thin Solid Films. 295:1997;87.
28. Tarte P. Spectrochim. Acta. 18:1961;467.
29. Miyanaga T., Watanabe I., Ikeda S., Tashiro K., Fujikawa T. Bull. Chem. Soc. Jpn. 61:1988;3199.
30. N.A. Lange, M. Gordon, B.S. Forker, Handbook of Chemistry, McGraw Hill, New York, 1961, p. 330.
31. Ben Amor S., Baud G., Besse J.P., Jacquet M. Thin Solid Films. 293:1997;163.
32. Ben Amor S., Baud G., Besse J.P., Jacquet M. Mater. Sci. Eng. B47:1997;110.