Study of development processes for ZEP-520 as a high-resolution positive and negative tone electron beam lithography resist

Japanese Journal of Applied Physics

Volumn 51, Issue 6 PART 2, 2012, Pages

  Mohammad, Mohammad Ali ^a   Koshelev, Kirill ^a,b   Fito, Taras ^a,b   Zheng, David Ai Zhi ^a   Stepanova, Maria ^a,b   Dew, Steven ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL METHOD; DENSE GRATINGS; DEVELOPMENT PROCESS; ELECTRON BEAM RESIST; HIGH RESOLUTION; HIGH SENSITIVITY; ISOPROPYL ALCOHOLS; KINETIC MODELS; METHYL ISOBUTYL KETONE; MICROSCOPIC PARAMETER; NEGATIVE TONES; PERFORMANCE METRICS; POSITIVE TONE;

ELECTRON BEAMS; KETONES;

DISSOLUTION;

EID: 84863309038     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.06FC05     Document Type: Article

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