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Volumn 25, Issue 1, 2007, Pages 102-105

Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon

Author keywords

[No Author keywords available]

Indexed keywords

LINEWIDTHS; OPTICAL SCATTEROMETRY METHODS; PATTERN TRANSFER;

EID: 34047160593     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2426976     Document Type: Article
Times cited : (20)

References (9)
  • 1
    • 0033099533 scopus 로고    scopus 로고
    • J. McIntosh, JOM 51, 38 (1999).
    • (1999) JOM , vol.51 , pp. 38
    • McIntosh, J.1
  • 5
    • 34047157330 scopus 로고
    • edited by D. M.Manos and D. L.Flamm (Academic, Boston
    • D. L. Flamm, in Plasma Etching, edited by, D. M. Manos, and, D. L. Flamm, (Academic, Boston, 1989), p. 131.
    • (1989) Plasma Etching , pp. 131
    • Flamm, D.L.1
  • 9
    • 34047163204 scopus 로고    scopus 로고
    • Handbook of Advanced Plasma Processing Techniques, edited by R.Shul and S.Pearton, (Springer, New York
    • J. E. Stevens, Plasma Fundamentals for Materials Processing in Handbook of Advanced Plasma Processing Techniques, edited by, R. Shul, and, S. Pearton, (Springer, New York, 2000), p. 60-61.
    • (2000) Plasma Fundamentals for Materials Processing , pp. 60-61
    • Stevens, J.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.