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Volumn 25, Issue 1, 2007, Pages 102-105
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Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon
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Author keywords
[No Author keywords available]
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Indexed keywords
LINEWIDTHS;
OPTICAL SCATTEROMETRY METHODS;
PATTERN TRANSFER;
DIFFRACTION GRATINGS;
ELECTRIC POTENTIAL;
ELECTRON BEAMS;
OPTICAL RESOLVING POWER;
OPTIMIZATION;
REACTIVE ION ETCHING;
POLYSILICON;
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EID: 34047160593
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2426976 Document Type: Article |
Times cited : (20)
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References (9)
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