Cold-developed electron-beam-patterned ZEP 7000 for fabrication of 13 nm nickel zone plates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2593-2596

  Reinspach, Julia ^a   Lindblom, Magnus ^a   Von Hofsten, Olov ^a   Bertilson, Michael ^a   Hertz, Hans M ^a   Holmberg, Anders ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM RESIST; HALF-PITCH GRATINGS; HARDMASKS; HEXYL ACETATE; POLYIMIDE LAYERS; SOFT X-RAY MICROSCOPY; TRI-LAYER RESISTS; ZONE PLATES;

FABRICATION; NICKEL; NICKEL ALLOYS; POLYIMIDES; REACTIVE ION ETCHING; SILICON COMPOUNDS;

OPTICAL INSTRUMENTS;

EID: 72849123318     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237140     Document Type: Conference Paper

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