Pattern transfer and post processing of complex nanostructures formed by e-beam exposure in PMMA

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2533-2536

  Gautsch, S ^a   De Rooij, N F ^a  

^a EPFL   (Switzerland)

Author keywords

Carbonization; Crosslinking; DRIE; E Beam; Nanopillars; Nanostructures; Negative; Pattern transfer; PMMA; Positive; Postprocessing; Self aligned

Indexed keywords

DRIE; E-BEAM; NANOPILLARS; NEGATIVE; PATTERN TRANSFERS; PMMA; POSITIVE; POSTPROCESSING; SELF-ALIGNED;

CARBONIZATION; LITHOGRAPHY;

NANOSTRUCTURES;

EID: 79960054173     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.012     Document Type: Conference Paper

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