Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate

Journal of Vacuum Science and Technology B

Volumn 28, Issue 1, 2010, Pages

  Mohammad, M A ^a   Fito, T ^a,b   Chen, J ^b   Aktary, M ^c   Stepanova, M ^b   Dew, S K ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c Applied Nanotools Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONS; NANOTECHNOLOGY; POLYESTERS;

DIFFUSION MOBILITY; ELECTRON-BEAM; ELECTRON-BEAM LITHOGRAPHY; EXPOSURE DOSE; HIGH EXPOSURES; KINETIC MODELS; LOW ENERGY ELECTRON BEAM LITHOGRAPHY; MOLECULAR MECHANISM; NANO PATTERN; SIMPLE++;

DISSOLUTION;

EID: 77949362893     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3268131     Document Type: Conference Paper

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