Effects of molecular properties on nanolithography in polymethyl methacrylate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 107-111

  Dobisz, Elizabeth A ^a   Brandow, Susan L ^a   Bass, Robert ^a   Mitterender, Jeffrey ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURVE FITTING; DIFFRACTION GRATINGS; DISSOLUTION; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; MOLECULAR WEIGHT; MONTE CARLO METHODS; NANOTECHNOLOGY; PLASTIC COATINGS; POLYMETHYL METHACRYLATES; SWELLING;

CHAIN SCISSION; ELECTRON BEAM RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033697655     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591242     Document Type: Article

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