Systematic study of the interdependence of exposure and development conditions and kinetic modelling for optimizing low-energy electron beam nanolithography

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1104-1107

  Mohammad, M A ^a   Fito, T ^a,b   Chen, J ^b   Buswell, S ^c   Aktary, M ^c   Stepanova, M ^a,b   Dew, S K ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c Applied Nanotools Inc   (Canada)

Author keywords

EBL; Kinetic modelling; Kinetics of resist development; Low voltage exposures; Nanofabrication

Indexed keywords

EBL; KINETIC MODELLING; LOW-VOLTAGE; NANOFABRICATION; RESIST DEVELOPMENT;

ELECTRON BEAMS; NANOSTRUCTURED MATERIALS; OPTIMIZATION;

THREE DIMENSIONAL;

EID: 76949106650     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.047     Document Type: Article

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