Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 768-779

  Aktary, M ^a   Stepanova, M ^b,c   Dew, S K ^b  

^a Applied Nanotools Inc   (Canada)

^b UNIVERSITY OF ALBERTA   (Canada)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; KINETIC THEORY; MOLECULAR WEIGHT;

ELECTRON DOSES; KINETIC TRANSPORT THEORY; SPATIAL DISTRIBUTION;

POLYMETHYL METHACRYLATES;

EID: 33645525068     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2181580     Document Type: Article

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