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Journal of Vacuum Science and Technology B

Volumn 29, Issue 2, 2011, Pages

Enhanced resolution and groove-width simulation in cold development of ZEP520A

(7) Okada, Takeru a Fujimori, Jiro a Aida, Makoto a Fujimura, Megumi a Yoshizawa, Tatsuya a Katsumura, Masahiro a Iida, Tetsuya a

a PIONEER CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS;

ELECTRON BEAM RECORDERS; ENHANCED RESOLUTIONS; EXPOSURE CONDITIONS; INCIDENT ELECTRONS; LINE-AND-SPACE PATTERNS; LOWER TEMPERATURES; POSITIVE-TONE RESISTS; RESOLUTION ENHANCEMENT;

ACTIVATION ENERGY;

EID: 79953785609 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3569892 Document Type: Article

Times cited : (19)

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