Complex nanostructures in PMMA made by a single process step using e-beam lithography

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1139-1142

  Gautsch, S ^a   Studer, M ^a   de Rooij, N F ^a  

^a EPFL   (Switzerland)

Author keywords

Autocentered; e Beam; Nanopillars; Nanostructures; PMMA

Indexed keywords

3-DIMENSIONAL; AUTOCENTERED; BACKSCATTERED ELECTRONS; COMPLEX NANOSTRUCTURES; E-BEAM LITHOGRAPHY; E-BEAM RESIST; ENERGY DENSITY DISTRIBUTIONS; EXPOSURE PARAMETERS; NANOPILLARS; QUALITATIVE AND QUANTITATIVE ANALYSIS; SINGLE PROCESS; SINGLE-STEP;

NANOSTRUCTURES;

EID: 76949091469     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.10.046     Document Type: Article

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