Optimal temperature for development of poly(methylmethacrylate)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2013-2016

  Cord, Bryan ^a   Lutkenhaus, Jodie ^a   Berggren, Karl K ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON RESIST; NEGATIVE TONE MODES;

COOLING; CROSSLINKING; ELECTRON BEAM LITHOGRAPHY; SENSITIVITY ANALYSIS; SOLUBILITY;

POLYMETHYL METHACRYLATES;

EID: 37149031271     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2799978     Document Type: Article

References (7)

1. F. J. Pantenburg, S. Achenbach, and J. Mohr, J. Vac. Sci. Technol. B 16, 3547 (1998).
2. M. J. Rooks, E. Kratschmer, R. Viswanathan, J. Katine, R. E. J. Fontana, and S. A. MacDonald, J. Vac. Sci. Technol. B 20, 2937 (2002).
3. W. Hu, K. Sarveswaran, M. Lieberman, and G. H. Bernstein, J. Vac. Sci. Technol. B 22, 1711 (2004).
4. L. E. Ocola and A. Stein, J. Vac. Sci. Technol. B 24, 3061 (2006).
5. W. H. Teh, C. Liang, M. Graham, and C. G. Smith, J. Microelectromech. Syst. 12, 641 (2003).
6. J. S. Greeneich and T. V. Duzer, J. Vac. Sci. Technol. 10, 1056 (1973).
7. J. S. Greeneich, J. Electrochem. Soc. 121, 1669 (1974).