SCOPUS 정보 검색 플랫폼

Dalton Transactions

Volumn 41, Issue 6, 2012, Pages 1678-1682

Ru cyclooctatetraene precursors for MOCVD

(5) Ando, Tatsuya a Nakata, Naoki a,b Suzuki, Kazuharu b Matsumoto, Takahiro a Ogo, Seiji a,c

a KYUSHU UNIVERSITY (Japan)

b TANAKA KIKINZOKU KOGYO K K (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; CHEMICAL VAPOUR DEPOSITION; CYCLOOCTATETRAENE; DECOMPOSITION TEMPERATURE; METAL ORGANIC; OPTIMAL PROPERTIES;

ASPECT RATIO; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; THIN FILMS;

LEAD COMPOUNDS;

EID: 84863020081 PISSN: 14779226 EISSN: 14779234 Source Type: Journal
DOI: 10.1039/c1dt11454a Document Type: Article

Times cited : (10)

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