New CVD source reagents for osmium thin film deposition

Chemical Vapor Deposition

Volumn 7, Issue 6, 2001, Pages 245-248

  Yu, Huan Li ^a   Chi, Yun ^a   Liu, Chao Shiuan ^a   Peng, Shie Ming ^b   Lee, Gene Hsiang ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001503617     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200111)7:6<245::AID-CVDE245>3.0.CO;2-Y     Document Type: Article

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