SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 520, Issue 9, 2012, Pages 3433-3439

Phase transformations in sputtered Ni-Mn-Ga magnetic shape memory alloy thin films

(6) Jetta, N a Ozdemir, N b Rios, S b Bufford, D b Karaman, I a,b Zhang, X a,b

a Department of Electrical and Computer Engineering (United States)

b TEXAS A AND M UNIVERSITY (United States)

Author keywords

In situ x ray diffraction; Magnetic shape memory alloys; NiMnGa; Phase segregation

Indexed keywords

AS-DEPOSITED FILMS; DC MAGNETRON SPUTTERING TECHNIQUE; HIGHER TEMPERATURES; IN-SITU; KISSINGER; LOW-ACTIVATION ENERGY; MAGNETIC SHAPE MEMORY ALLOYS; MARTENSITE PHASE TRANSFORMATION; NI-MN-GA MAGNETIC SHAPE MEMORY ALLOYS; NIMNGA; PARTIAL CRYSTALLINITY; PHASE SEGREGATIONS;

ACTIVATION ENERGY; AMORPHOUS FILMS; COMPOSITE BEAMS AND GIRDERS; GALLIUM; LOW TEMPERATURE OPERATIONS; MANGANESE; PHASE SEPARATION; PHASE TRANSITIONS; X RAY DIFFRACTION;

SHAPE MEMORY EFFECT;

EID: 84862806596 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.12.029 Document Type: Article

Times cited : (22)

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