Low temperature deposition of ferromagnetic Ni-Mn-Ga thin films from two different targets via Rf magnetron sputtering

Materials Research Society Symposium Proceedings

Volumn 1250, Issue , 2010, Pages 101-106

  Lourenco A C ^a   Figueiras, F ^a   Das, S ^a   Amaral, J S ^a,d   Kakazei, G N ^d   Karpinsky, D V ^a   Soares, N ^a   Peres, M ^b   Pereira, M J ^a   Santos, N M ^b   Tavares, P B ^c   Sobolev, N A ^b   Amaral, V S ^a   Kholkin, A L ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c UNIVERSITY OF TRÁS OS MONTES AND ALTO DOURO   (Portugal)

^d UNIVERSITY OF PORTO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; COERCIVE FORCE; CRYSTALLINITY; FERROMAGNETIC MATERIALS; FERROMAGNETISM; GALLIUM ALLOYS; HYSTERESIS; HYSTERESIS LOOPS; MAGNETRON SPUTTERING; MANGANESE ALLOYS; SAPPHIRE; SATURATION MAGNETIZATION; SUBSTRATES; TERNARY ALLOYS; THIN FILMS;

CRYSTALLOGRAPHIC STRUCTURE; DEGREE OF CRYSTALLINITY; LOW SUBSTRATE TEMPERATURE; LOW-TEMPERATURE DEPOSITION; POST DEPOSITION ANNEALING; RF MAGNETRON SPUTTERING TECHNIQUE; RF-MAGNETRON SPUTTERING; THERMODYNAMIC CONDITIONS;

TEMPERATURE;

EID: 78650404876     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1250-g08-02     Document Type: Conference Paper

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