Crystallization and high temperature shape memory behavior of sputter-deposited NiMnCoIn thin films

Applied Physics Letters

Volumn 96, Issue 17, 2010, Pages

  Rios, S ^a   Karaman, I ^a   Zhang, X ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION ACTIVATION ENERGY; CRYSTALLIZATION PROCESS; DC MAGNETRON SPUTTERING TECHNIQUE; ELEVATED TEMPERATURE; EX-SITU ANNEALING; HIGH TEMPERATURE SHAPE MEMORY; IN-SITU ANNEALING; MARTENSITIC PHASE TRANSFORMATIONS; ROOM TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPE;

ACTIVATION ENERGY; DIFFERENTIAL SCANNING CALORIMETRY; MANGANESE; MANGANESE COMPOUNDS; MARTENSITE; MARTENSITIC TRANSFORMATIONS; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLIZATION;

EID: 77952330771     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3407670     Document Type: Article

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