Properties of sputter-deposited Ni-Mn-Ga thin films

Materials Science and Engineering: A

Volumn 481-482, Issue 1-2 C, 2008, Pages 271-274

  Chernenko, V A ^a,b   Besseghini, S ^b   Hagler, M ^c   Mullner P ^c   Ohtsuka, M ^d   Stortiero, F ^b  

^a INSTITUTE OF MAGNETISM   (Ukraine)

^b CNR   (Italy)

^c Boise State University   (United States)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

Magnetic anisotropy; Martensitic transformation; MgO(0 0 1) wafer; Ni Mn Ga thin film

Indexed keywords

ANNEALING; MAGNETIC ANISOTROPY; MAGNETIZATION; MARTENSITE; MARTENSITIC TRANSFORMATIONS; METALLIC FILMS; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ANNEALED FILMS; MARTENSITIC PHASE; SPUTTER-DEPOSITED THIN FILMS;

NICKEL ALLOYS;

ANNEALING; MAGNETIC ANISOTROPY; MAGNETIZATION; MARTENSITE; MARTENSITIC TRANSFORMATIONS; METALLIC FILMS; NICKEL ALLOYS; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

EID: 41949088394     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2006.12.206     Document Type: Article

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