Pulsed laser deposition of Ni-Mn-Ga thin films on silicon

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1505-1508

  Hakola, A ^a   Heczko, O ^a   Jaakkola, A ^a   Kajava, T ^a   Ullakko, K ^b  

^a AALTO UNIVERSITY   (Finland)

^b AdaptaMat Ltd   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; FERROMAGNETISM; HYSTERESIS; LITHOGRAPHY; MAGNETIZATION; MAGNETRON SPUTTERING; MARTENSITE; SEMICONDUCTOR MATERIALS; SHAPE MEMORY EFFECT; SILICON; THIN FILMS; VACUUM;

DROPLET DENSITY; MACROSCOPIC SHAPE CHANGE; MAGNETIC SHAPE-MEMORY (MSM) EFFECT; SUBSTRATE TEMPERATURES;

PULSED LASER DEPOSITION;

EID: 4344632184     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2831-7     Document Type: Conference Paper

References (21)

1. K. Ullakko, J.K. Huang, C. Kantner, R.C. O'Handley, V.V. Kokorin: Appl. Phys. Lett. 69, 1966 (1996)
2. R.C. O'Handley: J. Appl. Phys. 83, 3263 (1998)
3. O. Heczko, A. Sozinov, K. Ullakko: IEEE Trans. Magn. 36, 3266 (2000)
4. A. Sozinov, A.A. Likhachev. N. Lanska, K. Ullakko: Appl. Phys. Lett. 80, 1746 (2002)
5. J. Tellinen, I. Suorsa, A. Jääskeläinen, I. Aaltio, K. Ullakko: Proc. AC-TUATOR 2002 Int. Conf. (Bremen, Germany 2002) p. 566
6. P. Krulevitch, A.P. Lee, P.B. Ramsey. J.C. Trevino, J. Hamilton. M.A. Northrup: J. Microelectromech. Syst. 5, 270 (1996)
7. C. Jiang, G. Feng, S. Gong, H. Xu: Mater. Sci. Eng. A 342, 231 (2003)
8. I. Takeuchi, O.O. Famodu, J.C. Read, M.A. Aronova, K.-S. Chang, C. Craciunescu, S.E. Lofland, M. Wuttig, F.C. Wellstood, L. Knauss, A. Orozco: Nat. Mater. 2, 180 (2003)
9. K. Bhattacharya, A. DeSimone, K.F. Hane, R.D. James, C.J. Palmstrøm: Mater. Sci. Eng. A 273-275, 685 (1999)
10. J.W. Dong, L.C. Chen, C.J. Palmstrøm, R.D. James, S. McKernan: Appl. Phys. Lett. 75, 1443 (1999)
11. J.W. Dong, L.C. Chen, J.Q. Xie, T.A.R. Müller, D.M. Carr, C.J. Palmstrpm, S. McKernan, Q. Pan. R.D. James: J. Appl. Phys. 88, 7357 (2000)
12. J.W. Dong, J. Lu, J.Q. Xie, L.C. Chen, R.D. James, S. McKernan, C.J. Palmstrøm: Physica E 10, 428 (2001)
13. Q. Pan, J.W. Dong, C.J. Palmstrøm, J. Cui, R.D. James: J. Appl. Phys. 91, 7812 (2002)
14. S.I. Patil, D. Tan, S.E. Lofland, S.M. Bhagat, I. Takeuchi, O. Famodu, J.C. Read, K.-S. Chang, C. Craciunescu, M. Wuttig: Appl. Phys. Lett. 81, 1279 (2002)
15. P.G. Tello, F.J. Castaño, R.C. O'Handley, S.M. Allen, M. Esteve, F. Castaño, A. Labarta, X. Batlle: J. Appl. Phys. 91, 8234 (2002)
16. F.J. Castaño, B. Nelson-Cheeseman, R.C. O'Handley, C.A. Ross, C. Redondo, F. Castaño: J. Appl. Phys. 93, 8492 (2003)
17. V. Podgurski, S. Galambos: in Proc. DAAAM Int. Conf. (Tallinn, Estonia, 2000) p. 229
18. M. Tuohiniemi, T. Kajava, T. Katila, M.M. Salomaa, R. Salomaa, E. Supponen: Appl. Phys. A 69, S451 (1999)
19. O. Heczko, N. Lanska, O. Söderberg, K. Ullakko: J. Magn. Magn. Mater. 242-245, 1446 (2002)
20. D.B. Chrisey, G.K. Hubler (eds.): Pulsed Laser Deposition of Thin Films (Wiley, New York 1994) pp. 455-471
21. J.W. Dong, J.Q. Xie, J. Lu, C. Adelmann, C.J. Palmstrøm, J. Cui, Q. Pan, T.W. Shield, R.D. James, S. McKernan: J. Appl. Phys. 95, 2593 (2004)