Microstructural, mechanical and magnetic properties of shape memory alloy Ni55Mn23Ga22 thin films deposited by radio-frequency magnetron sputtering

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 399-412

  Bernard, F ^a   Delobelle, P ^a   Rousselot, C ^a   Hirsinger, L ^a  

^a FEMTO ST INSTITUTE   (France)

Author keywords

Magnetic properties; Mechanical properties; Ni Mn Ga; Shape memory alloy; Thin film

Indexed keywords

ANNEALED FILMS; CRYSTAL STRUCTURE AND MORPHOLOGY; CRYSTALLOGRAPHIC STRUCTURE; DIFFUSION PROCESS; FERROMAGNETIC ALLOYS; FERROMAGNETIC PROPERTIES; HIGH TEMPERATURE; INDENTATION MODULUS; INTERNAL STRESS; MAGNETIC ACTUATION; MAGNETIC SHAPE MEMORY; MAGNETOSTRAIN; MARTENSITIC PHASE; MARTENSITIC STRUCTURES; MEAN STRESS; MECHANICAL STRESS; MICRO-STRUCTURAL; NI-MN-GA; POLYCRYSTALLINE THIN FILM; POST DEPOSITION ANNEALING; R.F. SPUTTERING; RADIO-FREQUENCY-MAGNETRON SPUTTERING; SHAPE MEMORY; SHAPE MEMORY ALLOY; SILICON SUBSTRATES; SMART MATERIALS; SPUTTERING PROCESS; STRESS GRADIENT; VACUUM-ANNEALING;

AMORPHOUS SILICON; ANNEALING; CRYSTAL STRUCTURE; DEPOSITION; FERROMAGNETIC MATERIALS; FERROMAGNETISM; GALLIUM ALLOYS; HARDNESS; MAGNETIC FIELDS; MAGNETIC PROPERTIES; MANGANESE; MANGANESE COMPOUNDS; MARTENSITE; NICKEL; SEMICONDUCTING SILICON COMPOUNDS; SHAPE MEMORY EFFECT; SILICON ALLOYS; SILICON OXIDES; SILICON WAFERS; STRESSES; STRUCTURAL PROPERTIES; SUBSTRATES; THERMAL EFFECTS; THIN FILM DEVICES; THIN FILMS;

MECHANICAL PROPERTIES;

EID: 69549129509     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.037     Document Type: Article

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