Martensite structures and twinning in substrate-constrained epitaxial Ni-Mn-Ga films deposited by a magnetron co-sputtering process

Physics Procedia

Volumn 10, Issue , 2010, Pages 168-173

  Tillier, Jérémy ^a,b   Bourgault, Daniel ^a   Pairis, Sébastien ^a   Ortega, Luc ^a   Caillault, Nathalie ^b   Carbone, Laurent ^b  

^a CNRS   (France)

^b SCHNEIDER ELECTRIC   (France)

Author keywords

Deposition by co sputtering; Epitaxial growth; Ni Mn Ga magnetic shape memory alloy; Structure; Thin film

Indexed keywords

DEPOSITION; EPITAXIAL FILMS; FILM GROWTH; GALLIUM; GALLIUM ALLOYS; MAGNETRONS; MANGANESE; MARTENSITE; METAL IMPLANTS; NICKEL; PROCESS CONTROL; SHAPE MEMORY EFFECT; SPUTTERING; STRUCTURE (COMPOSITION); THIN FILMS;

COSPUTTERING; FILM COMPOSITION; HIGH TEMPERATURE; MAGNETRON CO-SPUTTERING PROCESS; MARTENSITE STRUCTURES; MARTENSITE VARIANTS; MICRO AND MACRO; NI-MN-GA MAGNETIC SHAPE MEMORY ALLOYS;

EPITAXIAL GROWTH;

EID: 79551622105     PISSN: 18753884     EISSN: 18753892     Source Type: Conference Proceeding    
DOI: 10.1016/j.phpro.2010.11.094     Document Type: Conference Paper

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