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Applied Surface Science

Volumn 256, Issue 22, 2010, Pages 6655-6659

Growth of Ni-Mn-Ga high-temperature shape memory alloy thin films by magnetron sputtering technique

(7) Liu, C a Mu, H W a Gao, L X b Ma, W J c An, X b Gao, Z Y d Cai, W d

a NORTHEAST PETROLEUM UNIVERSITY (China)

b HEILONGJIANG UNIVERSITY (China)

c NORTHEAST ELECTRIC POWER UNIVERSITY (China)

d HARBIN INSTITUTE OF TECHNOLOGY (China)

Author keywords

Ni Mn Ga; Shape memory alloy (SMA); Sputtering; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; GALLIUM ALLOYS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; MANGANESE ALLOYS; MARTENSITIC TRANSFORMATIONS; MICROSTRUCTURE; PARTICLE SIZE; SHAPE MEMORY EFFECT; SPUTTERING; SURFACE ROUGHNESS; TERNARY ALLOYS; TRANSMISSION ELECTRON MICROSCOPY;

AVERAGE PARTICLE SIZE; ENERGY DISPERSIVE X-RAY; HIGH TEMPERATURE SHAPE MEMORY ALLOY; MARTENSITIC STRUCTURES; NI-MN-GA; SHAPE MEMORY ALLOYS(SMA); SUBSTRATE NEGATIVE BIAS; TRANSMISSION ELECTRON MICROSCOPY OBSERVATION;

THIN FILMS;

EID: 77955660982 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.04.065 Document Type: Article

Times cited : (8)

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